Vacuum Pump for Semiconductor

Hanbell iPH Series

The rapid advancement of semiconductor technology is projecting a more complex manufacturing process with increasing difficulty. The ability of the modern day’s harsh-process dry vacuum pumps had presented a quantum advance in pumping technology.  Not only does the dry vacuum pump today needs to evacuate and maintain a consistent vacuum for the process chamber, but it also needs to have a unique capability to support the abatement challenges as well. Fortunately, Hanbell iPH Series dry vacuum pump meets all these specifications.

Pump manufacturer needs to meet up the challenges like avoiding the risk of unplanned downtime and possible product losses. At the same time, these harsh dry vacuum pumps need to accommodate better power consumption and durability in order to aid customers to achieve rewarding operating costs.

For harsh process vacuum pumps, the common challenges like corrosion and condensation pose a deterrent factor against the abovementioned advantages of power consumption and maintenance costs. Hence, the pump manufacturer needs to balance these trade-offs against the demanding process.

To address these challenges, innovative solutions and perseverant attitudes together with intimate comprehension of the processes and materials become an edge to design an avant-garde solution.

The iPH dry process pumps are energy and cost-efficient solutions in today’s demanding Semiconductor processes.

What Processes are Considered Harsh-Duty?

The harsh-duty processes refer to those aggressive chemical processes and/or dusty by-products generated within the vacuum processed chamber. Most of these harsh processes are typically etching, chemical vapor deposition (CVD), atomic layer deposition (ALD) as well as metal-organic chemical vapor deposition (MOCVD).

Why iPH Series?

Hanbell’s iPH vacuum pumps adopted suitable corrosive resistant materials to reduce its cost of ownership while maintaining a great lifetime. These pumps can also handle a high volume of by-products while maintaining the safety level of applications running explosive gases. In the harsh-duty vacuum environment, some processes offer a high occurrence of powder. Therefore, these iPH series are specially designed to customize these processes that may lead to unplanned downtime due to accumulation within the vacuum pump.